轻工机械2013，Vol.31Issue(1)：63-66,4.DOI:10.3969/j.issn.1005-2895.2013.01.016
磁控溅射TiAlN薄膜的制备及性能研究
Study on Properties and Preparation of TiAlN Films by Unbalanced Magnetron Sputtering
张靖华 1金杰 2倪茂林 2吴锋2
作者信息
- 1. 杭州汽轮机股份有限公司,浙江杭州310022
- 2. 浙江工业大学机械工程学院,浙江杭州 310014
- 折叠
摘要
Abstract
TiAIN films were prepared by closed field unbalanced magnetron sputtering ion plating on the surface of tool-steel. EDS, XRD and SEM were used to test the films' chemical composition, microstructure and surface morphology. In addition, the films' surface microhardness, bonding strength and friction coefficient were also determined. The experimental results indicate that the TiAIN films of different substrate hardness have dense film structure and the same chemical composition, the hard substrate microhardness of the film can reach 2 575 HV0.025 and soft substrate can be up to 2 295 HV0.025 with friction coefficients abouts 0.45 and 0.50 respectively.关键词
TiAlN薄膜/组织结构/显微硬度/摩擦系数Key words
TiAIN films/ microstructure/ microhardness/ friction coefficient分类
通用工业技术引用本文复制引用
张靖华,金杰,倪茂林,吴锋..磁控溅射TiAlN薄膜的制备及性能研究[J].轻工机械,2013,31(1):63-66,4.
