人工晶体学报2013，Vol.42Issue(1)：52-57,6.
磁控溅射参数对(Ba,Sr)TiO3薄膜择优取向生长的影响
Effect of RF-magnetron Sputtering Parameters on the Growth of (Ba, Sr) TiO3 Thin Film with Preferred Orientations
摘要
Abstract
(Ba, Sr)TiO3 films were fabricated on Pt/Ti/SiO2/Si substrate by RF-magnetron sputtering. Based on the theory of film nucleation, the influences of RF sputtering parameters, such as sputtering pressure, substrate-target distance, substrate temperature, sputtering power etc. , on microstructure and preferred orientation of film were investigated. The experimental results indicate that higher substrate temperature favors the formation of the perovskite phase of the film. The ( 111 ) , (001 ) , (110)-preferred orientation can be obtained by changing the sputtering parameters.关键词
BST/择优取向/磁控溅射/形核Key words
BST/ preferred orientation/ RF-magnetron sputtering/ nucleation分类
数理科学引用本文复制引用
王梦,张发生,刘根华,于军..磁控溅射参数对(Ba,Sr)TiO3薄膜择优取向生长的影响[J].人工晶体学报,2013,42(1):52-57,6.基金项目
国家自然科学基金(60971008)资助项目 （60971008）
