物理学报2013，Vol.62Issue(1)：487-493,7.DOI:10.7498/aps.62.018104
氧化法结合快速热处理制备VOx薄膜及其性质研究
Preparation of vanadium oxide thin films by oxidation with rapid thermal processing
摘要
Abstract
Vanadium thin films are deposited by magnetron sputter. Then VOx thin films are fabricated by a series of rapid thermal processes (RTPs) in pure oxygen environment. X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscope are employed to analyze crystalline structure of the thin film, phase composition and surface morphology. Electrical and optical properties of VOX thin film are measured by the four-point probe method and THz time-domain spectroscopy technology, respectively. The results reveale that the VOX thin film which is composed mainly of V2O5 and VO2 has the properties of phase transition to a certain extent within the RTP condition of heat preservation temperature and time, and the overall valence of vanadium remains unchanged, no matter whether the RTP condition is the same. The best performance VOX thin film can be obtained under the moderate RTP condition, such as 500 ℃ 25 s, and this film can also modulate the THz wave.关键词
氧化钒薄膜/相变特性/快速热处理/THz调制Key words
vanadium oxide thin films/ phase transition/ rapid thermal process/ THz modulation引用本文复制引用
高旺,胡明,后顺保,吕志军,武斌..氧化法结合快速热处理制备VOx薄膜及其性质研究[J].物理学报,2013,62(1):487-493,7.基金项目
国家自然科学基金青年科学基金(批准号:61101055)和高等学校博士学科点专项科研基金(批准号:20100032120029)资助的课题. （批准号:61101055）
