现代电子技术2013，Vol.36Issue(1)：144-146,3.
纳米级ta-C薄膜对二次电子发射抑制的研究
Research on secondary electron emission suppression using nanoscale ta-C film
摘要
Abstract
The multipactor discharge restricts the development of space communication technique seriously. In this paper, a method for suppressing the secondary electron emission using the ta-C film with nanometers thickness was presented. The technolo-gy of deposing the ta-C film on the aluminum electrode with the silver film was studied. As well as, the sp2 content of the film and the thickness of the film affecting the secondary electron emission coefficient were investigated in detail. The results showed that the secondary electron emission coefficient for treated electrode was decreased obviously, and the maximum value of the secondary elec-tron emission coefficient was reduced by 35 percent compared with untreated one. Moreover, when the thickness of the film was more than 5 nm, the secondary electron emission coefficient was decreased obviously; when thickness of the film was more than 10 nm, the secondary electron emission coefficient was increased on the contrary. The experimental results indicated that the film was mainly graphite morphology types with low secondary electron emission property because of high sp2 content when the thick-ness of the film was between 5 nm and 10 nm. In results, the ta-C film can suppress the secondary electron emission very well.关键词
ta-C薄膜/二次电子倍增放电/抑制二次电子发射/过滤阴极真空电弧Key words
ta-C film/multipactor discharge/secondary electron emission suppression/filtered cathodic vacuum arc分类
信息技术与安全科学引用本文复制引用
张娜,陈仙,康永锋..纳米级ta-C薄膜对二次电子发射抑制的研究[J].现代电子技术,2013,36(1):144-146,3.基金项目
空间微波技术重点实验室资助项目(914C5304011003) （914C5304011003）
