物理学报2012，Vol.61Issue(22)：287-293,7.
增强辉光放电等离子体离子注入的三维PIC／MC模拟
Numerical simulation of enhanced glow discharge plasma immersion ion implantation using three-dimensional PIC/MC model
摘要
Abstract
Enhanced glow discharge plasma immersion ion implantation is self-consistently simulated using a three-dimensional PIC/MC model. The information about ion counts, space potential, plasma density and ion incident dose is obtained. The results show that the sheath has fully expanded at 5 μs. There is a stable equilibrium of ion counts at 15 μs, which corroborates the characteristic of self- sustaining glow discharge of EGD-PIII. In the space just below anode where is found a highest plasma density, verifying the electron focusing effect. The rate of implantation is steady and the incident dose is relatively uniform except at the rim of target. A higher pulse negative bias may increase the injection rate but reduce the dose uniformity at the same time.关键词
三维粒子模拟/蒙特卡洛/等离子体浸没离子注入/数值模拟Key words
three-dimensional particle-in-cell/Monte Carlo/plasma immersion ion implantation/numerical simulation分类
信息技术与安全科学引用本文复制引用
何福顺,李刘合,李芬,顿丹丹,陶婵偲..增强辉光放电等离子体离子注入的三维PIC／MC模拟[J].物理学报,2012,61(22):287-293,7.基金项目
国家自然科学基金（批准号：11075012）资助的课题. （）
