传感技术学报2013，Vol.26Issue(1)：1-6,6.DOI:10.3969/j.issn.1004-1699.2013.01.001
运用研磨和化学机械抛光技术制备高品质的石英薄膜
High-Quality Quartz Thin Film Prepared by Lapping and Chemical & Mechanical Polishing Technology
摘要
Abstract
The quality of quartz thin film is a key to various kinds of quartz-based micro and nano devices. This paper presents techniques to gain high quality quartz thin film with lapping and chemical & mechanical polishing (CMP). Due to high hardness of quartz, diamond slurry and ductile iron plate are used for lapping the quartz substrate to get higher grinding rate and better roughness of the grinded surface. Fro CMP, a special procedure of "2-step-polishing" is developed, for which the first step is to use diamond slurry containing 0. 3 μm particles mixed with SiO, slurry containing 50 nm particles, and the second step is to use only SiO2 slurry. Tested results show that a high quality quartz film, with thickness of(25. l±3.2)μm and roughness of 0.89 nm(RMS) ,is acquired by using the techniques presented in the paper.关键词
微机电系统MEMS(Micro-Electro-Mechanical Systems)/石英薄膜/研磨/CMPKey words
MEMS( Micro-Electro-Mechanical Systems) /quartz film/lapping/CMP分类
信息技术与安全科学引用本文复制引用
曾毅波,刘畅,陈观生,赵祖光,郭航..运用研磨和化学机械抛光技术制备高品质的石英薄膜[J].传感技术学报,2013,26(1):1-6,6.基金项目
国家自然科学基金重点项目(60936003) （60936003）
