人工晶体学报2013，Vol.42Issue(2)：226-229,245,5.
磁控溅射法制备非晶IGZO透明导电薄膜
Preparation of IGZO Amorphous Transparent Conductive Thin Films by RF Magnetron Sputtering
摘要
Abstract
IGZO thin films were prepared on glass substrates by RF magnetron sputtering, and the properties of IGZO films and deposition condition were studied. The influence of sputtering power on structural, electrical and optical characteristics was discussed. The merit figure (FTC) for revaluing transparent electrodes can reach to 1. 94 × 10 -3 Ω-1 for IGZO films deposited at power 50 W. The corresponding resistivity and average transmittance are 2.6 × 10 -3 Ω·cm and 87.2%.关键词
磁控溅射/IGZO/非晶薄膜/透明导电膜Key words
magnetron sputtering/IGZO/amorphous thin films/transparent conductive thin films分类
信息技术与安全科学引用本文复制引用
梁朝旭,李帅帅,王雪霞,李延辉,宋淑梅,杨田林..磁控溅射法制备非晶IGZO透明导电薄膜[J].人工晶体学报,2013,42(2):226-229,245,5.基金项目
山东省自然科学基金(ZR2009AM020) （ZR2009AM020）
山东大学自主创新基金(2011ZRXT002,2011ZRYQ010) （2011ZRXT002,2011ZRYQ010）
