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保持温度对偏轴磁控溅射法制备BiFeO3薄膜结构和性能的影响

郝彦磊 刘保亭 彭增伟 贾冬梅 朱慧娟 张宪贵

人工晶体学报2013,Vol.42Issue(2):246-250,5.
人工晶体学报2013,Vol.42Issue(2):246-250,5.

保持温度对偏轴磁控溅射法制备BiFeO3薄膜结构和性能的影响

Effect of Retained Temperature on the Structure and Property of BiFeO3 Thin Film Prepared by Off-axis Magnetron Sputtering Method

郝彦磊 1刘保亭 1彭增伟 1贾冬梅 1朱慧娟 1张宪贵1

作者信息

  • 折叠

摘要

Abstract

The polycrystalline BiFeO3 (BFO) thin films were deposited on Pt/TiO2/SiO2/Si ( 111 ) substrates by off-axis magnetron sputtering at temperature of 680 °C. In order to investigate the electronic property, Pt/BFO/Pt heterostructure capacitors was fabricated. The effect of retained temperature on the structural and physical properties of BFO thin film was investigated by X-ray diffraction ( XRD) and a ferroelectric tester. XRD result shows that the BFO thin films were polycrystalline, and it is strongly depended on the keeping temperatures. It was found that among the range of the temperatures about 400 ℃ ±2 ℃ there are pure- phase and polycrystalline BFO films obtained, but other phases unknown appeared during the temperatures out of the range. A good saturated hysteresis loop can be tested for BFO ferroelectric film of 900 nm maintained at 400 ℃ with Pr >40 μC/cm2, which is larger than the standard 0use of Pr = 10 μC/cm2. Meanwhile, it was found that the leakage conduction mechanism of the Pt/BFO/ Pt capacitor satisfied the ohmic conduction behavior at low applied fields and approximately bulk-limited space-charge-limited conduction (SCLC) at the high applied fields.

关键词

偏轴磁控溅射/保持温度/XRD/BiFeO3

Key words

off-axis magnetron sputtering/retained temperature/XRD/BiFeO3

分类

化学化工

引用本文复制引用

郝彦磊,刘保亭,彭增伟,贾冬梅,朱慧娟,张宪贵..保持温度对偏轴磁控溅射法制备BiFeO3薄膜结构和性能的影响[J].人工晶体学报,2013,42(2):246-250,5.

基金项目

国家自然科学基金(11074063) (11074063)

河北省应用基础研究计划重点项目(10963525D) (10963525D)

高等学校博士点基金(20091301110002) (20091301110002)

人工晶体学报

OA北大核心CSCDCSTPCD

1000-985X

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