安徽大学学报（自然科学版）2013，Vol.37Issue(2)：81-87,7.DOI:10.3969/j.issn.1000-2162.2013.02.015
利用FT-IR和XPS研究纳米和微米氮化硅粉体在不同气氛下的表面结构变化
Study on the surface structure of nano-and micro-silicon nitride in different atmospheres by FT-IR and XPS
摘要
Abstract
In this paper,surface structure's change regularity of nano-and micro-silicon nitride powder in air and nitrogen atmospheres was studied by FT-IR and XPS.The results showed that nano-silicon nitride in air gradually absorbed oxygen and organic matter,and Si-OH,C-C,C-N groups were produced on the surface of nano-silicon nitride.While in an inert atmosphere (N2),surface oxidation of nano-silicon nitride can be effectively suppressed.This work will be a helpful mechanism research on the surface modification of Si3 N4 nanopowder.关键词
氮化硅/表面结构/FT-IR/XPSKey words
silicon nitride / surface structure / FT-IR / XPS分类
化学化工引用本文复制引用
夏茹,郝家宝,张立成,钱家盛,袁孝友,李彬..利用FT-IR和XPS研究纳米和微米氮化硅粉体在不同气氛下的表面结构变化[J].安徽大学学报（自然科学版）,2013,37(2):81-87,7.基金项目
Supported by the University Natural Science Research Project of Anhui Province of China (KJ2011Z015),211 Project of Anhui University,Project of Key Laboratory of Environment-friendly Polymer Materials of Anhui Provincial (KF2011010),Research Fund for the Doctoral Program of Higher Education of China (20113401110003),Business Incubators Project of Science and Technology Enterprise for Anhui Province (10100206015-02),General Administration of Quality Supervision,Inspection and Quarantine (2010IK079) （KJ2011Z015）
