强激光与粒子束2013，Vol.25Issue(4)：929-934,6.DOI:10.3788/HPLPB20132504.0929
HfO2/SiO2多层高反膜激光预处理技术
Laser conditioning methods for hafnia silica multilayer high-reflective coatings
摘要
Abstract
Single-step and multi-step laser conditioning methods for HfO2/SiO2 multilayer high-reflective (HR) coatings prepared by electron-beam evaporation were introduced, with the use of different beam increment between pulses. In order not to damage the coating, the maximum conditioning fluence can not exceed 90% of its unconditioned laser induced damage threshold (LIDT). The LIDT enhancement of the coating after single-step conditioning is more than that after multi-step conditioning under the same conditioning efficiency. After two-step laser conditioning with a beam increment between pulses equal to the beam diameter at 98. 4% of the peak intensity, the LIDT of the coating attains 181% of that of the unconditioned coating. The starting material composition for the hafnia layers has a direct impact on the concentration of defects imbedded in the coating, it is believed that coatings deposited from hafnium have defect-seeds at a significantly lower density.关键词
激光预处理/缺陷/能量覆盖/高反射膜Key words
laser-conditioning/ defect/ energy overlap/ high-reflective coating分类
信息技术与安全科学引用本文复制引用
代福,杨李茗..HfO2/SiO2多层高反膜激光预处理技术[J].强激光与粒子束,2013,25(4):929-934,6.
