表面技术2013，Vol.42Issue(2)：92-94,121,4.
直流反应磁控溅射制备a-C:H薄膜及其表面粗糙度研究
Study on Deposition of a-C:H Film by Reactive DC Magnetron Sputtering and Its Surface Roughness
摘要
Abstract
The -CH3 atoms methane gas was filled to study the preparation and performance of the hydrogen-containing DLC(a-C:H) thin film. At different CH4/Ar flow ratio condition, the a-C:H was deposited on the N type silicon substrate. By means of ellipsometer, the non-contact white light interferometer as well as the laser wave interferometer, the deposition rate and surface roughness were lucubrated. Experiment results show that the deposition rate of the diamond-like carbon thin film is enhanced by the addition of the hydrogen-containing carbon gas and the surface flatness is also improved.关键词
直流反应磁控溅射/含氢类金刚石薄膜/沉积速率/表面粗糙度Key words
reactive DC magnetron sputtering/ DLC films with various hydrogen contents/ deposition rate/ surface roughness分类
矿业与冶金引用本文复制引用
张艳茹,杭凌侠,郭峰,宁晓阳..直流反应磁控溅射制备a-C:H薄膜及其表面粗糙度研究[J].表面技术,2013,42(2):92-94,121,4.基金项目
陕西省教育厅科学研究计划项目(12JK0433) （12JK0433）
