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快中子辐照直拉硅中的空位型缺陷

杨帅 徐建萍 邓晓冉 陈贵锋

硅酸盐学报2013,Vol.41Issue(6):808-811,4.
硅酸盐学报2013,Vol.41Issue(6):808-811,4.DOI:10.7521/j.issn.0454-5648.2013.06.15

快中子辐照直拉硅中的空位型缺陷

Monovacancy Type Defects in Fast Neutron Irradiated Czochralski Silicon

杨帅 1徐建萍 2邓晓冉 3陈贵锋4

作者信息

  • 1. 天津理工大学理学院,天津 300384
  • 2. 天津理工大学材料科学与工程学院,天津 300384
  • 3. 天津职业技术师范大学理学院,天津 300222
  • 4. 河北工业大学材料科学与工程学院,天津 300130
  • 折叠

摘要

Abstract

The irradiation defects in neutron-irradiated Czochralski silicon (CZSi) were analyzed by positron annihilation spectroscopy and Fourier transform infrared (FTIR) spectroscopy.The results show that there are the massive monovacancy-type defects (VO)and multi-vacancy-type defects (V2 and V2O) in irradiated CZSi.After heat-treatment at 200-450 ℃,the absorption bands at 720and 919.6 cm-1 in measured FTIR spectra are associated with the monovacancy-type defects,and they have the same positron lifetime as VO (i.e.,290 ps).After heat-treatment at 450-600 ℃,the monovacancy-type is eliminated gradually,the V4-type defects are enhanced,and the concentration of the V4-type defects reaches a maximum of 70% after heat-treatment at 600 ℃.

关键词

直拉硅/正电子湮没/中子辐照/空位型缺陷

Key words

Czochralski silicon/ positron annihilation/ neutron irradiate/ vacancy-type defect

分类

信息技术与安全科学

引用本文复制引用

杨帅,徐建萍,邓晓冉,陈贵锋..快中子辐照直拉硅中的空位型缺陷[J].硅酸盐学报,2013,41(6):808-811,4.

基金项目

国家自然科学基金项目(10904109,50872028) (10904109,50872028)

河北省教育厅科研计划项目(2009318) (2009318)

天津理工大学校级项目(LGYM-201016)资助. (LGYM-201016)

硅酸盐学报

OA北大核心CSCDCSTPCD

0454-5648

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