青岛大学学报（自然科学版）2013，Vol.26Issue(2)：30-33,4.DOI:10.3969/j.issn.1006-1037.2013.05.07
温度对磁控溅射法制备的NiO薄膜的影响
Temperature Dependence of NiO Thin Films Deposited by RF Magnetron Sputtering
摘要
Abstract
NiO thin films were deposited on glass substrates at different temperatures by RF magnetron sputtering from a NiO target.The effect of the deposition temperature on the structural,optical and electrical properties of the NiO thin films were investigated by the X-ray diffraction (XRD),atomic force microscopy (AFM),scanning electron microscopy (SEM),spectrophotometer and four-point probe system.The results indicate that the preferred orientation of the deposited NiO films is the (111) orientation,and the lattice constant decreases with the increasing deposition temperature.The grain size and the root means square roughness (RMS) also increase with the temperature.Due to the decrease of the nickel vacancies and the oxygen interstitials in the NiO thin films,the transmittance,band-gap energy and the resistivity all increase with the increasing deposition temperature.关键词
NiO/磁控溅射/镍空位/间隙氧Key words
NiO/ Magnetron sputtering/ Nickel vacancy/ Oxygen interstitial分类
数理科学引用本文复制引用
耿广州,单福凯,张倩,刘国侠,Shin B.C.,Lee W.J.,Kim I.S...温度对磁控溅射法制备的NiO薄膜的影响[J].青岛大学学报（自然科学版）,2013,26(2):30-33,4.基金项目
山东省自然科学基金项目支持(项目编号:ZR2011FM010和ZR2012FM02). （项目编号:ZR2011FM010和ZR2012FM02）
