机电工程技术Issue(10)：84-87,4.DOI:10.3969/j.issn.1009-9492.2012.10.025
磁流变-化学机械复合抛光装置设计
Design on a Chemo-Mechanical Magneto-Rheological Finishing Apparatus
摘要
Abstract
The growth of epitaxial layer of SiC wafer requires the surface of SiC substrate to reach atomic scale accuracy. To solve this problem,the paper proposes a new precisive polishing apparatus based on Chemo-mechanical Magneto-rheological Finishing(CMMRF) , which can make precise control the movement of polishing disc and workpiece with software platform,also the apparatus has equipped with micro adjustment and display function module to rotation speed and temperature. The working principle and structure of this new polishing apparatus is introduced,and some experiments have been carried out and high material removal rate and smooth,uniform, zero-defect surface were obtained.关键词
化学机械抛光/磁流变抛光/复合抛光Key words
chemical mechanical polishing/magneto-rheological finishing/compound finishing分类
矿业与冶金引用本文复制引用
祝江停,阎秋生,高伟强..磁流变-化学机械复合抛光装置设计[J].机电工程技术,2012,(10):84-87,4.基金项目
国家自然科学基金项目(编号:50875050和U1034006) （编号:50875050和U1034006）
广东省自然科学基金重点项目(编号:9251009001000009) （编号:9251009001000009）
