表面技术2013，Vol.42Issue(4)：24-27,4.
氧氩流量比对溅射氧化钒薄膜结构和光学性能的影响
Influence of Gas Flow Ratio of Oxygen and Argon on Structure and Optical Properties of Sputtered Vanadium Dioxide Thin Films
摘要
Abstract
Vanadium dioxides (VOx) films were fabricated by reactive r.f.magnetron sputtering technique.Deposition rate,phase structure,surface morphology and transmittance in visible range of the films were characterized.Influence of oxygen/argon flow ratio on structure and optical properties of the films was investigated at same deposition air pressure.Results show that the flow ratio can modify the microstructure of the films,as oxygen/argon flow ratio increases,deposition rate of the films decreases while granular size as well as transmittance of the films increases.关键词
氧化钒薄膜/氧气流量/氩气流量/反应磁控溅射Key words
vanadium oxides thin film/oxygen flow/argon flow/reactive magnetron sputtering分类
矿业与冶金引用本文复制引用
杜姗,黄美东,刘春伟,唐晓红,吕长东..氧氩流量比对溅射氧化钒薄膜结构和光学性能的影响[J].表面技术,2013,42(4):24-27,4.基金项目
国家自然科学基金(61078059) （61078059）
天津师范大学推进计划项目(52X09038) （52X09038）
