强激光与粒子束2013，Vol.25Issue(8)：2000-2006,7.DOI:10.3788/HPLPB20132508.2000
模板法交流沉积金纳米线的影响因素
Influencing factors of Au nanowires fabricated in porous aluminum oxide template by AC electrodeposition
摘要
Abstract
The Au nanowires were formed in porous aluminum oxide template by AC electrodeposition method,and the in fluence of the thickness of barrier layer,voltage and frequency in the AC plating progress was discussed.The diameter of Au nanowires was 30 nm,and the average length was 2.1 μm.The results show that the thickness of the barrier layer would significantly influence the deposition potential,which turned to be the key factor of the deposition process.The current-time curves were recorded to analyze the AC electrodeposition process,showing that the length of nanowires increased proportionately with the alternating voltage,and the stable current of the reaction increased with the frequency.These facts can be explained by the semiconductor property of the barrier layer.关键词
多孔氧化铝模板/阻挡层/交流电沉积/金纳米线Key words
porous aluminum oxide template/barrier layer/AC electrodeposition/Au nanowire分类
化学化工引用本文复制引用
吴曌,张云望,杜凯..模板法交流沉积金纳米线的影响因素[J].强激光与粒子束,2013,25(8):2000-2006,7.基金项目
国家高技术发展计划项目 （）
