无机材料学报2014，Vol.29Issue(2)：215-219,5.DOI:10.3724/SP.J.1077.2013.13385
铜对双靶共溅制备热电薄膜输运性能的影响
Influence of Cu on Transport Properties of Thermoelectric Thin Film Fabricated via Magnetron Co-sputtering Method
摘要
关键词
半导体/薄膜/热电性能/磁控溅射Key words
semiconductors/ thin films/ thermoelectric properties/ magnetron sputtering分类
通用工业技术引用本文复制引用
曹丽莉,王瑶,邓元,罗炳威,祝薇,史永明,林桢..铜对双靶共溅制备热电薄膜输运性能的影响[J].无机材料学报,2014,29(2):215-219,5.基金项目
Foundation item:National Natural Science Foundation of China(50772005,51002006) （50772005,51002006）
National High Technology Research and Development Program of China(2009AA03Z322) （2009AA03Z322）
Fundamental Research Funds for the Central Universities and Key Laboratory of Photochemical Conversion and Optoelectronic Materials,TIPC,CAS （）
