物理学报Issue(2)：028104-1-028104-7,7.DOI:10.7498/aps.63.028104
沉积温度对钛硅共掺杂类金刚石薄膜生长、结构和力学性能的影响
Effect of deposition temperature on growth, structure and mechanical properties of diamond-like carbon films co-dop ed by titanium and silicon
摘要
Abstract
Titanium and silicon co-doped diamond-like carbon films are deposited on Si substrates by middle-frequency mag-netron sputtering Ti80Si20 composite target. The influences of deposition temperature on the growth rate, chemical composition, structure, surface and mechanical properties of the film are investigated. The results show that the growth rate of the film decreases as substrate temperature increases. With the increasing of substrate temperature, Ti and Si atom content values in the film increase, while C atom content value decreases. At high temperatures, the film has low sp3C fraction, surface contact angle, compressive stress, and high hardness, and elastic modulus. The influences of deposition temperature on the growth and bonding structure of the film are analyzed in view of the subplantation growth model. The changes in surface and mechanical properties are correlated with the growth mechanism and microstructures of the film.关键词
类金刚石薄膜/共掺杂/沉积温度/结构与性能Key words
diamond-like carbon film/co-doping/deposition temperature/structure and properties引用本文复制引用
姜金龙,黄浩,王琼,王善民,魏智强,杨华,郝俊英..沉积温度对钛硅共掺杂类金刚石薄膜生长、结构和力学性能的影响[J].物理学报,2014,(2):028104-1-028104-7,7.基金项目
国家自然科学基金(批准号:51105186)、甘肃省自然科学基金(批准号:1014RJZA007)和兰州理工大学优秀青年基金(批准号:1010ZCX010)资助的课题.@@@@ Project supported by the National Natural Science Foundation of China (Grant No.51105186), the Natural Science Foun-dation of Gansu Province, China (Grant No.1014RJZA007), and Excellent Young Teachers Program of Lanzhou University of Technology, China (Grant No.1010ZCX010) （批准号:51105186）
