中山大学学报（自然科学版）Issue(1)：78-82,5.
Bi1.6 La0.4 Ti2O7薄膜的制备及性能研究
Preparation and Properties of Bi1.6 La0.4 Ti2 O7
摘要
Abstract
Bi1.6La0.4Ti2O7 (BLT)thin films were prepared on ITO glass substrates using a chemical so-lution deposition method.Their structures,dielectric properties,current-voltage (I-V)curves and optical constants were analyzed.The result of X-ray diffraction (XRD)analysis showed that the thin films an-nealed at 500,550 and 600 ℃for 1 h were grown in pyrochlore structure and no secondary phase was de-tected.Also,the XRD peaks of BLT annealed at 600 ℃ was stronger than those annealed at other tem-peratures.The dielectric constant and dissipation factor (at 1 kHz)were 1 14 and 3%,129 and 3%, 194 and 6%,respectively,for films annealed 500,550 and 600 ℃.Leakage current densities of BLT thin films versus applied voltage curves suggested that the value of leakage current for films annealed at 600 ℃ was much smaller than those annealed at 500 and 550 ℃.The annealing temperature had little effect on the optical band gap of the films with the values of 3.7 eV.These results indicated that the BLT thin films annealed at 600 ℃ had an excellent property,and they had a potential application in optico-electric devices.关键词
化学溶液沉积法/Bi1.6La0.4Ti2O7/光学带隙/介电Key words
chemical solution deposition method/Bi1.6La0.4Ti2O7/optical band gap/dielectric分类
数理科学引用本文复制引用
陈如麒,徐初东,朱贵文..Bi1.6 La0.4 Ti2O7薄膜的制备及性能研究[J].中山大学学报（自然科学版）,2014,(1):78-82,5.基金项目
国家自然科学基金资助项目（61308038）；广东省自然科学基金博士启动基金资助项目（S2013040015235）；华南农业大学校长科学基金资助项目 （）
