首页|期刊导航|半导体学报(英文版)|Comparison for the carrier mobility between the Ⅲ-Ⅴ nitrides and AlGaAs/GaAs heterostructure field-effect transistors
半导体学报(英文版)2014,Vol.35Issue(9):65-70,6.DOI:10.1088/1674-4926/35/9/094007
Comparison for the carrier mobility between the Ⅲ-Ⅴ nitrides and AlGaAs/GaAs heterostructure field-effect transistors
Comparison for the carrier mobility between the Ⅲ-Ⅴ nitrides and AlGaAs/GaAs heterostructure field-effect transistors
摘要
关键词
Ⅲ-Ⅴ nitride and AlGaAs/GaAs HFETs/polarization Coulomb field scattering/2DEG electron mobilityKey words
Ⅲ-Ⅴ nitride and AlGaAs/GaAs HFETs/polarization Coulomb field scattering/2DEG electron mobility引用本文复制引用
Luan Chongbiao,Lin Zhaojun,Lü Yuanjie,Feng Zhihong,Zhao Jingtao,Zhou Yang,Yang Ming..Comparison for the carrier mobility between the Ⅲ-Ⅴ nitrides and AlGaAs/GaAs heterostructure field-effect transistors[J].半导体学报(英文版),2014,35(9):65-70,6.基金项目
Project supported by the National Natural Science Foundation of China (No.11174182),the Specialized Research Fund for the Doctoral Program of Higher Education (No.20110131110005),and the Graduate Independent Innovation Foundation of Shandong University,GIIFSDU (No.yzc12064). (No.11174182)