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Surface roughness of optical quartz substrate by chemical mechanical polishing

Duan Bo Zhou Jianwei Liu Yuling Sun Mingbin Zhang Yufeng

半导体学报（英文版）2014，Vol.35Issue(11)：168-172,5.

半导体学报（英文版）2014，Vol.35Issue(11)：168-172,5.DOI:10.1088/1674-4926/35/11/116001

Surface roughness of optical quartz substrate by chemical mechanical polishing

Duan Bo ¹Zhou Jianwei ¹Liu Yuling ¹Sun Mingbin ¹Zhang Yufeng¹

作者信息

1. Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China
折叠

摘要

关键词

quartz substrate/ surface roughness/ removal rate/ CMP/ process parameters

Key words

quartz substrate/ surface roughness/ removal rate/ CMP/ process parameters

引用本文复制引用

Duan Bo,Zhou Jianwei,Liu Yuling,Sun Mingbin,Zhang Yufeng..Surface roughness of optical quartz substrate by chemical mechanical polishing[J].半导体学报（英文版）,2014,35(11):168-172,5.

基金项目

Project supported by the Natural Science Foundation of Hebei Province (No.E2013202247),the Science and Technology Plan Project of Hebei Province (Nos.Z2010112,10213936),and the Hebei Province Department of Education Fund (No.2011128). （No.E2013202247）

半导体学报（英文版）

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ISSN：1674-4926

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