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Effect of three kinds of guanidinium salt on the properties of a novel low-abrasive alkaline slurry for barrier CMP

Chen Guodong Liu Yuling Niu Xinhuan

半导体学报（英文版）2014，Vol.35Issue(11)：179-183,5.

半导体学报（英文版）2014，Vol.35Issue(11)：179-183,5.DOI:10.1088/1674-4926/35/11/116003

Effect of three kinds of guanidinium salt on the properties of a novel low-abrasive alkaline slurry for barrier CMP

Chen Guodong ¹Liu Yuling ¹Niu Xinhuan¹

作者信息

1. Institute of Microelectronics, Hebei University of Technology, Tianjin 300130, China
折叠

摘要

关键词

guanidinium/ removal rate selectivity/ electrochemical/ CMP

Key words

guanidinium/ removal rate selectivity/ electrochemical/ CMP

引用本文复制引用

Chen Guodong,Liu Yuling,Niu Xinhuan..Effect of three kinds of guanidinium salt on the properties of a novel low-abrasive alkaline slurry for barrier CMP[J].半导体学报（英文版）,2014,35(11):179-183,5.

基金项目

Project supported by the Special Project Items NO.2 in National Long-Term Technology Development Plan,China (No.2009ZX02308) and the Hebei Natural Science Foundation of China (E2013202247). （No.2009ZX02308）

半导体学报（英文版）

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ISSN：1674-4926

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