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β-FeSi2 films prepared on 6H-SiC substrates by magnetron sputtering

Li Hong Pu Hongbin Zheng Chunlei Chen Zhiming

半导体学报（英文版）2015，Vol.36Issue(6)：29-34,6.

半导体学报（英文版）2015，Vol.36Issue(6)：29-34,6.DOI:10.1088/1674-4926/36/6/063005

β-FeSi2 films prepared on 6H-SiC substrates by magnetron sputtering

Li Hong ¹Pu Hongbin ¹Zheng Chunlei ¹Chen Zhiming¹

作者信息

1. Department of Electronic Engineering, Xi'an University of Technology, Xi'an 710048, China
折叠

摘要

关键词

β-FeSi2 films/6H-SiC substrates/magnetron sputtering/X-ray diffraction (XRD)

Key words

β-FeSi2 films/6H-SiC substrates/magnetron sputtering/X-ray diffraction (XRD)

引用本文复制引用

Li Hong,Pu Hongbin,Zheng Chunlei,Chen Zhiming..β-FeSi2 films prepared on 6H-SiC substrates by magnetron sputtering[J].半导体学报（英文版）,2015,36(6):29-34,6.

基金项目

Project supported by the National Natural Science Foundation of China (No.51177134) and the Natural Science Basic Research Plan in Shaanxi Province of China (No.2015JM6286). （No.51177134）

半导体学报（英文版）

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ISSN：1674-4926

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