癌变·畸变·突变Issue(3)：180-184,5.DOI:10.3969/j.issn.1004-616x.2014.03.005
Hoechst33342/PI双染法和TUNEL染色技术检测神经细胞凋亡的对比研究
A comparative study on the measurement of neuronal cell apoptosis by Hoechst33342/PI double staining and TUNEL assay
摘要
Abstract
OBJECTIVE: To evaluate the effects of nano-silica(nm-SiO2) on apoptosis of neuroblastoma cells,and compare the advantages and disadvantages of Hoechst33342/PI staining and TUNEL assay in apoptosis measurement. METHODS:Cultured human neuroblastoma SK-N-SH cells were treated with nm-SiO2 (15 and 30 nm) and micro-sized SiO2 at different doses (2.5,5 and 10μg/mL) for 24 h. Apoptotic cells were detected by Hoechst33342/PI and TUNEL staining. RESULTS:Compared with normal control,the percentages of total apoptosis in nm-SiO2-treated cells were significantly increased by both methods. CONCLUSION:nm-SiO2 increased apoptosis of SK-N-SH cells in a dose-and size-dependent manner. Hoechst33342/PI is more specific,cheaper and simpler,while TUNEL assay is more sensitive. It is recommended to combine these two methods to assess apoptosis in neuronal cells.关键词
纳米二氧化硅/神经细胞/凋亡/Hoechst33342/PI双染/TUNELKey words
nm-SiO2/neuronal cells/apoptosis/Hoechst33342/PI double staining/TUNEL分类
医药卫生引用本文复制引用
杨细飞,贺春娥,汤瑞华,田生礼,刘建军..Hoechst33342/PI双染法和TUNEL染色技术检测神经细胞凋亡的对比研究[J].癌变·畸变·突变,2014,(3):180-184,5.基金项目
国家自然科学基金(81102154)；广东省医学科研基金资助项目(B2012322)；深圳市科学研究计划(医疗卫生类)(201202086)；深圳市重点实验室提升项目(ZDSY20120615085804889) （81102154）
