表面技术Issue(3)：6-9,24,5.
硼源浓度对纳米金刚石薄膜掺硼的影响
Influence of Borane Concentration on the Boron-doping of Nano-crystalline Diamond Films
摘要
Abstract
Objective In order to study the intrinsic mechanism of doping borane during the growth of nano-crystalline diamond films to achieve precise control of the process. Methods Nano-crystalline diamond ( NCD) films were boron doped by the micro-wave plasma enhanced chemical vapor deposition ( MPCVD) method using hydrogen diluted di-borane as boron source. The influ-ences of borane concentration on grain size, surface roughness, surface resistance and boron atom concentration of boron-doped NCD films were investigated. Results The surface roughness and grain size of nanocrystalline diamond films increased with increas-ing concentrations of boron source. The surface resistance first showed a downward trend with increasing boron concentrations, and then gradually reached equilibrium. Conclusion The results showed that doping of boron could improve the surface conductivity performance of nano-crystalline diamond films and increase its surface roughness and grain size. By comprehensive comparison, the optimal borane concentration was 0. 02% under the doping condition of 700 ℃ and 15 min.关键词
纳米金刚石薄膜/掺硼/硼源浓度/化学气相沉积Key words
nano-crystalline diamond film/doping boron/boron concentration/chemical vapor deposition分类
矿业与冶金引用本文复制引用
熊礼威,崔晓慧,汪建华,龚国华,邹伟..硼源浓度对纳米金刚石薄膜掺硼的影响[J].表面技术,2014,(3):6-9,24,5.基金项目
国家自然科学基金项目(11175137) （11175137）
湖北省教育厅科学技术研究项目(Q20121501) （Q20121501）
武汉工程大学科学研究基金(11111051)Fund：National Natural Science Foundation of China(11175137) （11111051）
Science and Technology Research Projects of Hubei Provincial Department of Education (Q20121501) （Q20121501）
Scientific Research Fund of Wuhan Institute of Technology(11111051) （11111051）
