表面技术Issue(5)：87-90,4.
晶体硅表面制绒参数优化分析
Parameter Optimization of Texture of Crystalline Silicon Wafers
摘要
Abstract
Objective To study the effect of the mixture solution of NaOH, HF and HNO3 on the texture of crystalline silicon wafers. Methods The monocrystalline silicon wafer was corroded by changing NaOH concentration, isopropyl alcohol (IPA) con-centration and corrosion time. The polycrystalline silicon wafer (Poly-Si) was corroded by changing the concentration of acid solu-tion. The texture was analyzed by means of the SEM images and the surface reflectance of silicon. Results The optimum corrosion parameters were 15 g/ L for NaOH, 15% ~ 20% for IPA volume fraction, 10 minutes for corrosion time at 80 ℃ for thermokalite. At these optimized parameters, the size of pyramids was even with height of about 5 μm. The adjacent pyramids were linked to each other and the surface reflectance of silicon was reduced to 15% . The corrosion rate was 2 μm/ min at the mixture solution of V(HF) : V(HNO3 ) : V(CH3 COOH)= 10 : 1 : 10, and the texture showed like ravine. Conclusion The acid-base property of the solution and the addition of IPA have significant influence on the texture of crystalline silicon and directly affect the surface reflec-tance of silicon.关键词
单晶硅/制绒/反射率Key words
monocrystalline silicon/texturization/reflectance分类
信息技术与安全科学引用本文复制引用
种法力..晶体硅表面制绒参数优化分析[J].表面技术,2014,(5):87-90,4.基金项目
江苏省高校自然科学基金(12KJD480002) （12KJD480002）
江苏省“青蓝工程冶资助项目@@@@Fund：Supported by the Natural Science Fund for Colleges and Universities in Jiangsu Province (12KJD480002) and Jiangsu Province Qinglan Project （12KJD480002）
