哈尔滨商业大学学报（自然科学版）Issue(3)：308-311,4.
基体偏压对磁控溅射 TiAlN 薄膜性能的影响
Effect of substrate bias on characteristic of TiAlN films
摘要
Abstract
In this paper , TiAlN film was prepared by using medium frequency twin magnetron sputtering technology and adjusting the size of the substrate negative bias in the process of thin film deposition with Q235 carbon steel as matrix .Atomic force microscope ( AFM) were used to observe surface morphology , and potentiodynamic polarization test were carried out to study film for electrochemical corrosion form , by steps, and microhardness meter measuring film thickness and hardness , using X-ray photoelectron spectrometer test film organization composition .The results showed that TiAlN film surface was smooth , and the roughness was low.Along with the increase of bias , the film thickness , microhardness and corrosion resist-ance were presented first , after the trend of decrease .When negative bias increased to 60 V, thin film of corrosion potential and corrosion current density was respectively 256 .2 mV and 7.81 ×10 -6 A/cm2 , and the corrosion resistance was maximum .X-ray photoelectron spec-troscopy ( XPS) test results showed that along with the increase of negative bias picture , Al/Ti ratio decreased .关键词
TiAlN薄膜/中频/磁控溅射/脉冲偏压/性能Key words
TiAlN film/medium frequency/megnetron sputtering/pulsed bias引用本文复制引用
刘丽,孙智慧,林晶,肖玮..基体偏压对磁控溅射 TiAlN 薄膜性能的影响[J].哈尔滨商业大学学报（自然科学版）,2014,(3):308-311,4.基金项目
黑龙江省自然科学基金（ZD201106），深圳市科技研发资金 （）
