金刚石与磨料磨具工程Issue(3)：23-28,6.DOI:10.13394/j.cnki.jgszz.2015.3.0005
氮气体积浓度对高微波功率沉积金刚石膜的影响
Influence of nitrogen concentration on the deposition of diamond films with high microwave power
摘要
Abstract
The effects of nitrogen concentration on the deposition of diamond films were systematically investigated in a 10 kW home-made cylindrical overmoded MPCVD apparatus•Comprehensive analysis for the diamond films deposited in the condition of high microwave power as well as various nitrogen concentrations and substrate temperatures were carried out using the characterization results obtained from SEM,XRD and Raman•The results show that the injection of nitrogen could increase the deposition rate and secondary nucleation of diamond films,simultaneously•And the effect of increasing secondary nucleation would be dominated with the decrease of substrate temperature in the CVD diamond films growth•Therefore,there should be an appropriate nitrogen concentration range for the deposition of nanocrystalline diamond films with relatively high quality•The results of experiment carried out at the substrate temperature of 750 ℃ ascertain that the relative high quality nanocrystalline diamond films with the crystal size of around 50 nm could be prepared with nitrogen concentration of 0•03% - 0•07%.关键词
氮气体积浓度/高功率/微波等离子体/化学气相沉积/金刚石膜Key words
nitrogen concentration/high microwave power/microwave plasma/chemical vapor deposition/diamond film分类
化学化工引用本文复制引用
翁俊,刘繁,孙祁,王小安,黄平,周璐,陈义,汪建华..氮气体积浓度对高微波功率沉积金刚石膜的影响[J].金刚石与磨料磨具工程,2015,(3):23-28,6.基金项目
国家自然科学基金(No.11175137) （No.11175137）
