无机材料学报Issue(8)：875-879,5.DOI:10.15541/jim20130641
CO在U2N3+xOy薄膜表面反应特性研究
Surface Behaviors of U2N3+xOy Films in CO Atmosphere
摘要
Abstract
U2N3+xOy films were deposited on Si substrate by magnetic sputtering deposition method. The behaviors of U2N3+xOy after exposure to CO atmosphere was analyzed by X-ray photoelectron spectroscopy (XPS) to explore its CO corrosion mechanism. Under ultra-high vacuum (UHV) condition, it is found that CO atmosphere is oxidative on the surface of U2N3+xOy film. The dissociated carbon in forms of amorphous is segregated on the outmost surface rather than diffuses inside, and the diffusion of the dissociated oxygen resulted in oxidation of U2N3+xOy, leading to the formation of uranium oxy-nitrides in higher valence state on the surface and an N-rich layer as an intermediacy in the subsurface. The diffusion of oxygen in the film is suppressed on the very surface by the product of uranium oxides or ura-nium oxy-nitrides in higher valence state due to the potential barrier. The distance of the N-rich layer to the outmost surface dominates the intensity variation of satellites at 386.7 eV and 397.5 eV, which is enlarged with the oxidation process. All abore chemical changes play a very important role for understanding the corrosion mechanism of U2N3+xOy films.关键词
CO/U2N3+xOy/表面腐蚀/氧化Key words
CO/U2N3+xOy/surface corrosion/oxidation分类
化学化工引用本文复制引用
罗丽珠,陆雷,刘柯钊,赵东海..CO在U2N3+xOy薄膜表面反应特性研究[J].无机材料学报,2014,(8):875-879,5.基金项目
中国工程物理研究院资助项目(2011AO301015) CAEP Research Fund (2011AO301015) （2011AO301015）
