计算机技术与发展Issue(1)：164-167,172,5.DOI:10.3969/j.issn.1673-629X.2015.01.037
基于KMC方法的Ag膜生长初期的计算机模拟
Computer Simulation of Initial Growth of Ag Film Based on KMC
摘要
Abstract
In this paper,aimed at the lattice characteristics of silver and silver film growth feature,the silver film growth model is set up based on KMC,surface morphology of monolayer Ag film is simulated. Under the condition of periodic basement and interlayer between atoms,use EAM ( Embedded Atom Method) to calculate the inter-atomic potential. According to the characteristics of the lattice of metal Ag and film-forming characteristic,carry out the modeling,programming,and experiment. The results show that in the case of constant temperature,with the increase of coverage, the number of surface atoms increases, and a two-dimensional island growth raises. The growth of the island morphology has experienced the process from scattered to the growth of the condensation. The number of atoms is-land is reduced,at the same time,the size of the island is increased.关键词
银薄膜生长/蒙特卡洛方法/嵌入式原子方法/计算机模拟Key words
silver film growth/KMC method/EAM/computer simulation分类
信息技术与安全科学引用本文复制引用
武频,孙建城,张慧茹..基于KMC方法的Ag膜生长初期的计算机模拟[J].计算机技术与发展,2015,(1):164-167,172,5.基金项目
国家自然科学基金资助项目(11002086/A020415,51103083) （11002086/A020415,51103083）
