液晶与显示Issue(2)：257-262,6.DOI:10.3788/YJYXS20153002.0257
TFT-LCD 制程中 Sand Mura 的失效模式分析及改善研究
Research and improvement of Sand Mura failure mode in TFT-LCD array process
史高飞 1沈奇雨 1许徐飞 1宋洁 1赵娜 1韩基挏 1李乘揆1
作者信息
- 1. 合肥京东方光电科技有限公司，安徽 合肥 230011
- 折叠
摘要
Abstract
Mura is a common defect which degrades display quality greatly in TFT-LCD process.Sand Mura was studied in this paper which happened in a new product development,and the experiments were carried out by Macroscopic and Microscopic Inspection(M/M),Scanning Electron Microscope (SEM),Focused Ion beam(FIB)and so on.Experimental results show that the pixel electrode ITO open happened in the over wet etch process is the root cause of Sand Mura defect,and it also lead to liquid crystal molecules deflected exception,therefore,the light was shielded and dark spots were generated;By adjusting the thickness of pixel electrode ITO film,etch time and other measures,pixel electrode open can be avoid which is related to the over etch in the PVX hole,the defect ratio of Sand Mura can be reduce to 0.3% and the display quality of product was effectively improved.In addition, the optimizing via design scheme and above mentioned results provide valuable data and theory basis for related issues in the development stage of new product.关键词
TFT-LCD/Sand Mura/过刻/厚度/刻蚀时间Key words
TFT-LCD/Sand Mura/over etch/thickness/etch time分类
信息技术与安全科学引用本文复制引用
史高飞,沈奇雨,许徐飞,宋洁,赵娜,韩基挏,李乘揆..TFT-LCD 制程中 Sand Mura 的失效模式分析及改善研究[J].液晶与显示,2015,(2):257-262,6.
