原子能科学技术Issue(11)：1938-1942,5.DOI:10.7538/yzk.2014.48.11.1938
铀表面磁控溅射镍镀层的电化学腐蚀行为研究
Electrochemical Corrosion Behavior of MSIP Ni Coating on Depleted Uranium Surface
陈林 1李科学 1王庆富 1王小红 1管卫军1
作者信息
- 1. 中国工程物理研究院，四川绵阳 621900
- 折叠
摘要
Abstract
The Ni film was prepared by magnetron sputtering ion plating to improve the corrosion resistance of depleted uranium . T he corrosion resistance of the Ni film w as examined by electrochemical corrosion station .The results show that the Ni film corro‐sion potential is -100.8 mV ,w hereas it is -641.2 mV for depleted uranium in 50 μg/g KCl solution .The Ni film is a barrier to protect the depleted uranium substrate avoiding the corrosive media attack .The Ni film polarization resistance and impedance are much higher ,while the corrosion current density is much lower contrast with depleted urani‐um .None crack or flake is found through 70 h corrosion .The corrosion resistance and corrosion current keep stable .It is indicated that the corrosion resistance of depleted uranium is effectively improved after deposited Ni film by magnetron sputtering ion plating .关键词
贫铀/磁控溅射/镍镀层/电化学腐蚀Key words
depleted uranium/magnetron sputter ion plating/Ni coating/electrochemi-cal corrosion分类
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陈林,李科学,王庆富,王小红,管卫军..铀表面磁控溅射镍镀层的电化学腐蚀行为研究[J].原子能科学技术,2014,(11):1938-1942,5.
