中国机械工程Issue(22)：3008-3011,4.DOI:10.3969/j.issn.1004-132X.2014.22.005
新型环保抛光液的制备及其对软脆碲锌镉晶片的化学机械抛光
Chemical Mechanical Polishing of Soft-brittle CdZnTe Wafers Using a Developed Environment-friendly Solution
摘要
Abstract
A strategy consisting of fixed-abrasive lapping and a developed environment-friendly so‐lution was proposed for polishing cadmium zinc telluride(CdZn Te or CZT ) .This was to eliminate the disadvantages for conventional machining method including free abrasive lapping ,polishing and chem‐ical mechanical polishing on CZT wafers .Waterproof paper of alumina with mesh size of 3000 was em‐ployed as fixed-abrasive lapping pad .Lapping experiments were conducted at a pressure of 17 kPa on CZT wafers .The rotation speeds for polishing plate and pad were as 80 r/min respectively ,and the du‐ration was as 5 min during lapping experiments .The developed environment-friendly solution consis‐ted of peroxide ,silica ,and natural orange juice that was used for pH modulator .Chemical mechanical polishing was carried out at a pressure of 28 kPa ,rotation speeds of 60 r/min for both of polishing pad and plate ,and a duration of 30 min .The experimental results show that ultra-smooth polished surfaces are achieved ,where surface roughness Ra ,root mean square(rms) ,and peak-to-valley(PV) values are as 0.568 nm ,0.724 nm ,and 6.061 nm ,respectively .关键词
碲锌镉/固结磨料/绿色环保抛光液/化学机械抛光Key words
CdZnTe/fixed abrasive/green and environment-friendly solution/chemical mechanical polishing分类
机械制造引用本文复制引用
张振宇,宋亚星,徐朝阁..新型环保抛光液的制备及其对软脆碲锌镉晶片的化学机械抛光[J].中国机械工程,2014,(22):3008-3011,4.基金项目
国家自然科学基金资助重大项目（91123013）；清华大学摩擦学国家重点实验室开放基金资助项目（SKLTKF12A08）；燕山大学亚稳材料制备技术与科学国家重点实验室开放基金资助项目（201302）；中央高校基本科研业务费专项资金资助项目 （）
