中国钼业Issue(5)：47-50,54,5.DOI:10.13384/j.cnki.cmi.1006-2602.2014.05.010
热处理温度对钼靶材微观组织和性能的影响
EFFECT OF THE ANNEALING TEMPERATURE ON MICROSTRUCTURE AND PROPERTIES OF MO TARGETS
摘要
Abstract
The effects of annealing temperature on microstructure, hardness and I-U curve of Mo sputtering targets were studied by means of quantitative metallographic techniques and hardness test. The results show that the grain size of Mo targets increases with increasing annealing temperature, as well as hardness of targets declined. The Mo target with annealing process of 1 200 ℃ for 1 hour has the most uniform organization. All the targets’ I-U curves are in line with the Thornton experiential formula, and the Mo target annealed in 1 200 ℃ has the best magnetron sputtering discharge performance.关键词
钼靶材/热处理温度/再结晶/伏安特性曲线Key words
Mo sputtering target/annealing temperature/recrystallization/I-U curve分类
矿业与冶金引用本文复制引用
张国君,马杰,安耿,孙院军..热处理温度对钼靶材微观组织和性能的影响[J].中国钼业,2014,(5):47-50,54,5.基金项目
国家“十二五”科技支撑计划项目:钨、钼的增值化利用产业化技术开发(2012BAE06B02) （2012BAE06B02）
