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Design space of electrostatic chuck in etching chamber

Sun Yuchun Cheng Jia Lu Yijia Hou Yuemin Ji Linhong

半导体学报（英文版）2015，Vol.36Issue(8)：94-100,7.

半导体学报（英文版）2015，Vol.36Issue(8)：94-100,7.DOI:10.1088/1674-4926/36/8/084004

Design space of electrostatic chuck in etching chamber

Sun Yuchun ¹Cheng Jia ¹Lu Yijia ¹Hou Yuemin ¹Ji Linhong¹

作者信息

1. State Key Laboratory of Tribology, Department of Mechanical Engineering, Tsinghua University, Beijing 100084, China
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摘要

关键词

design space/electrostatic chuck/clamping force/temperature control

Key words

design space/electrostatic chuck/clamping force/temperature control

引用本文复制引用

Sun Yuchun,Cheng Jia,Lu Yijia,Hou Yuemin,Ji Linhong..Design space of electrostatic chuck in etching chamber[J].半导体学报（英文版）,2015,36(8):94-100,7.

基金项目

Project supported by the Ministry of Science and Technology of China (No.2011ZX02403),and the National Natural Science Foundation of China (No.51175284). （No.2011ZX02403）

半导体学报（英文版）

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ISSN：1674-4926

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