苏州科技学院学报（自然科学版）Issue(3)：20-24,42,6.
瑞红RZJ-304光刻胶光刻工艺研究
A study on lithography process for the Ruihong RZJ-304 photoresist
摘要
Abstract
Lithography is a very important step in fabrication of semiconductor devices. In this paper , lithogra-phy process was studied to obtain the suitable parameters by using Ruihong RZJ-304 positive photoresist. This project was done by controlling exposure time , developing time , soft-baking time and so on. The optical grating was used as a mask. The result shows that mask shape was transferred to surface of silicon successfully. The pho-toresist lines were periodic array and almost the same as the optical grating mask. The thickness of the photore-sist lines was uniform. The proper lithography process for RZJ-304 photoresist was achieved successfully.关键词
RZJ-304光刻胶/光刻技术/光栅掩模版Key words
RZJ-304 photoresist/lithography/optical grating mask分类
信息技术与安全科学引用本文复制引用
庞梦瑶,程新利,秦长发,沈娇艳,唐运海,王冰..瑞红RZJ-304光刻胶光刻工艺研究[J].苏州科技学院学报（自然科学版）,2015,(3):20-24,42,6.基金项目
江苏省产学研前瞻性联合研究项目（BY2011133；BY2014061）；住房和城乡建设部科学技术项目（2014-K8-051）；苏州市科技发展计划（纳米专项）项目（ZXG2013041）；江苏省高等学校大学生实践创新训练计划项目 （）
