强激光与粒子束Issue(10)：1-5,5.DOI:10.11884/HPLPB201426.101017
弯月面涂胶及其胶厚均匀性的测量
Meniscus coating and thickness measurement of photoresist
摘要
Abstract
In order to realize uniform coating of photoresist on large area substrates,a small meniscus coating applicator is designed and assembled,and it is used to coat a substrate of 200 mm×200 mm.Then a thickness measurement system based on white light interference spectrometer is installed to measure the thickness distribution of the coated photoresist,the result shows that the peak value of the deviation is less than 5%.Thickness uniformity is analyzed for further optimizing the coating system and coating parameters.Finally the accuracy of the thickness measurement system is tested by comparing the measuring results with that of a surface profiler which has very high resolution and has been calibrated,and the deviation is less than 0.8%.关键词
弯月面涂胶/大面积涂胶/白光干涉/胶厚测量/均匀性Key words
meniscus coating/large area coating/white light interference/thickness measurement/uniformity分类
信息技术与安全科学引用本文复制引用
林继平,梁榉曦,刘正坤,王庆博,宝剑光,洪义麟,付绍军..弯月面涂胶及其胶厚均匀性的测量[J].强激光与粒子束,2014,(10):1-5,5.基金项目
国家自然科学基金项目(11375175) （11375175）
