物理学报Issue(17)：1-9,9.DOI:10.7498/aps.63.175201
高功率脉冲磁控溅射的阶段性放电特征
Phasic discharge characteristics in high p ower pulsed magnetron sputtering
摘要
Abstract
As one of the burgeoning physical vapor deposition (PVD) techniques, high power pulsed magnetron sputtering (HPPMS), which boasts high ionization rates of sputtered materials and does not suffer from macro-particles, has been investigated extensively recently. Herein, a new method to break down the discharge current into different characteristic components is employed to study the changes of the various parameters as the target voltage is increased at different pressure. Results show a phasic HPPMS discharge when the target voltage is increased, exhibiting an alternate rise of the peak and the platform of the target current. A small change at the discharge stage is observed with increasing pressure, and some stages are missing in some instances. Five discharge stages are found to correspond to the discharge of Ar atoms, Cr atoms, Ar ions, Cr ions, as well as multiply-charged Ar and Cr ions, respectively, according to the optical emission spectra obtained from the HPPMS discharge plasma. Adjacent discharge stages are also found to overlap under certain discharge conditions.关键词
高功率脉冲磁控溅射/放电靶电流/工作气压/阶段性放电Key words
high power pulsed magnetron sputtering/discharge target current/gas pressure/phasic discharge引用本文复制引用
吴忠振,田修波,李春伟,Ricky K.Y.Fu,潘锋,朱剑豪..高功率脉冲磁控溅射的阶段性放电特征[J].物理学报,2014,(17):1-9,9.基金项目
国家自然科学基金(批准号:51301004, U1330110)、中国博士后科学基金(批准号:2013M530010)和哈尔滨工业大学先进焊接与连接国家重点实验室开放课题研究基金(批准号：AWJ-M13-13)资助的课题 （批准号:51301004, U1330110）
