物理学报Issue(24)：1-8,8.DOI:10.7498/aps.63.248201
结合实际刻蚀数据的离子刻蚀产额优化建模方法∗
An optimization metho d for ion etching yield mo deling combined with factual etching data
摘要
Abstract
The profile surface simulation is an important method to study the ion etching mechanism. In profile surface simulation, the result of surface evolution is primarily determined by the surface evolution model and the etching yield optimization model as well. However, the currently available surface evolution model is not accurate enough. What’s more, most of the data used in etching yield optimization model are based on simulation, while no factual data are used to optimize the parameters of ion etching yield model. In order to solve these problems, the accuracy of current evolution model is improved, the optimal objects of etching yield model are redefined, and the factual etching data are introduced to optimize the etching yield model for the first time. In this paper, parallel method is also adopted to speed up the optimization process, whose optimized parameters are then applied to the etching simulation process that is based on cellular automata. The experimental results show that our proposed approach does improve the accuracy of simulation and greatly shorten the optimization process.关键词
实际刻蚀数据/刻蚀产额模型/刻蚀速率/多目标进化算法Key words
factual etching data/etching yield model/etching velocity/multi-object evolution algorithm引用本文复制引用
高扬福,孙晓民,宋亦旭,阮聪..结合实际刻蚀数据的离子刻蚀产额优化建模方法∗[J].物理学报,2014,(24):1-8,8.基金项目
国家重大科技专项(批准号:2011ZX2403-002)资助的课题.@@@@* Project supported by the National Science and Technology Major Project of the Ministry of Science and Technology of China (Grant No.2011ZX2403-002) （批准号:2011ZX2403-002）
