物理学报Issue(6)：1-5,5.DOI:10.7498/aps.64.067502
强磁场对不同厚度Fe-Ni纳米多晶薄膜的生长过程及磁性能的影响∗
Effects of high magnetic field on the growth and magnetic prop erties of Fe-Ni nano-p olycrystalline thin films with different thickness values
摘要
Abstract
The Fe-Ni nano-polycrystalline thin films of 21 nm and 235 nm in thickness are prepared by molecular beam vapor deposition in the absence and the presence of a magnetic field as high as 6 T. The results show that in the absence of the magnetic field, the 21-nm-thick thin films are formed by the grain stacks, and the sizes of grains are about 6–7 nm. In the presence of 6 T, the 5-nm-thick flat layers of interconnected grains of 21-nm-thick thin films are first formed on the surfaces of the substrates, and the grains are then elongated along the surfaces of substrates. Later on, the 21-nm-thick thin films are formed by 6–7 nm-size-grain stacks. In the absence of the magnetic field, the average grain size of the 235-nm-thick thin film is 3.6 nm in the early growth stage, and it is 5.6 nm in the middle growth stage. The growth way of thin film is akin to columnar growth in the final growth stage, and the grains are elongated along the growth direction. In the presence of 6 T, the 5-nm-thick flat layers of interconnected grains of 235-nm-thick thin films are also formed on the surfaces of the substrates, and the grains are elongated along the surfaces of substrates. Later on, the 235-nm-thick thin films are formed by about 6.1-nm-size-grain stacks. Accordingly, the coercive forces in the out-of-plane and in the in-plane of thin films of different thickness values decrease by the 6 T magnetic field.关键词
强磁场/气相沉积/生长过程/磁性能Key words
high magnetic field/vapor deposition/growth process/magnetic properties引用本文复制引用
曹永泽,王强,李国建,马永会,隋旭东,赫冀成..强磁场对不同厚度Fe-Ni纳米多晶薄膜的生长过程及磁性能的影响∗[J].物理学报,2015,(6):1-5,5.基金项目
国家自然科学基金项目(批准号:51425401,51101034)和中央高校基本科研业务费专项资金(批准号：N140902001, N130509002)资助的课题.* Project supported by the National Natural Science Foundation of China (Grant Nos.51425401,51101034), the Fundamental Research Funds for the Central Universities, China (Grant Nos. N140902001, N130509002) （批准号:51425401,51101034）
