物理学报Issue(6)：397-403,7.DOI:10.7498/aps.64.06780110.7498/aps.64.067801
线性微波化学气相沉积制备SiNx薄膜的微结构及光学性能研究∗
The microstructure and optical prop erties of SiNx dep osited by linear microwave chemical vap or dep osition
摘要
Abstract
SiNx films are synthesized on Si substrates in a home-made linear microwave plasma enhanced chemical vapor deposition system at different microwave powers, duty cycles, substrate temperatures, and ratios of silane (SiH4) flow to ammonia (NH3 ) gas flow. The effects of technological parameters on morphology of film surface, stoichiometric proportion, refractive index and deposition rate of SiNx film are characterized by scanning electron microscopy (SEM) and elliptical polarization instrument, and the relationships among stoichiometric proportion, refractive index and deposition rate are investigated. The results from SEM analysis indicate that the surfaces are smooth and the elements are homogeneously distributed in the films obtained under different deposition parameters. The ratio of SiH4 flow to NH3 gas flow and the duty cycle are the most critical factors determining the refractive index which can be changed from 1.92 to 2.33. The thickness measurements show that the deposition rate of SiNx film is affected by microwave power, duty cycle, substrate temperature and flow ratio. The maximum deposition rate achieved in the paper is 135 nm·min−1.关键词
氮化硅薄膜/线性微波化学气相沉积/折射率/沉积速度Key words
SiNx thin film/linear microwave chemical vapor deposition/refractivity/deposition rate引用本文复制引用
张健,巴德纯,赵崇凌,刘坤,杜广煜..线性微波化学气相沉积制备SiNx薄膜的微结构及光学性能研究∗[J].物理学报,2015,(6):397-403,7.基金项目
D o c t o r a l F u n d o f M i n i s t r y o f E d u c a t i o n o f C h i n a ( G r a n t N o .20120042110031) （ G r a n t N o .20120042110031）
