哈尔滨工程大学学报Issue(7)：929-932,4.DOI:10.3969/j.issn.1006-7043.201210014
NiTi合金薄膜生长初期的实验研究
Experimental study of NiTi alloy thin film at the initial stage of growth
摘要
Abstract
Radio frequency (RF) magnetron sputtering has been adopted as a new method for conducing research, aiming at solving the problem of how to control the number of Ni and Ti atoms during the preparation of NiTi alloy thin film. In this new preparation technology, we have chosen the pure Ni and Ti as the target materials, which are tilted and fixed and sputter simultaneously, at the same time the substrate rotates on its axis, This new technique can ensure the Ni and Ti atoms distributed evenly and control the ratio of the two atoms easily. The main objective of this paper is to investigate the rule of film atomic composition and surface morphology with different temperatures of the substrate and different sputtering powers at the initial stage of the film growth. The rule of substrate tempera⁃ture and sputtering power ratio influencing composition and island forming pattern of the film was obtained. The ex⁃periments show that as the substrate temperature increases, the size of the island increases and the amount decrea⁃ses. The two types of atoms can be near equal when the sputtering power ratio of Ni and Ti targets is 3.7.关键词
NiTi合金/薄膜/基底/形貌Key words
NiTi alloys/thin film/substrate/morphology分类
通用工业技术引用本文复制引用
朱祎国,毛文,潘茜..NiTi合金薄膜生长初期的实验研究[J].哈尔滨工程大学学报,2013,(7):929-932,4.基金项目
中央高校基本科研业务费专项资金资助项目（ DUT10LK42）；国家自然科学基金资助项目（11272072）． （）
