激光技术Issue(5)：592-595,4.DOI:10.7510/jgjs.issn.1001-3806.2013.05.007
离子束溅射、热舟和电子束法制备深紫外 LaF3薄膜
DUV LaF3 thin film deposited by IBS, thermal boat and electron beam evaporation
摘要
Abstract
In order to satisfy the requirements of coatings of deep ultraviolet(DUV) lithography objective lens and obtain coatings with low optical losses, high stability and long lifetimes, a deposition method should be confirmed first.LaF3 single layers were deposited upon fused silica by ion beam sputtering(IBS), boat and electron beam evaporation with optimized process parameters respectively.Firstly, based on spectrophotometry, the refractive index n and extinction coefficients k in 185nm~800nm of the LaF3 layer deposited with three methods were obtained.Secondly, the surface roughness of LaF3 layers was measured by means of atomic-force microscope (AFM).Finally, X-ray diffraction (XRD) was used to investigate the microstructure of LaF3 layer.Experimental results indicate that, LaF3 layer deposited by IBS has the highest refractive index and the lowest surface roughness but the highest extinction coefficients; for LaF3 layer deposited by electron beam, although its extinction coefficients is low, but the refractive index and surface roughness doesn’t seem good; as for thermal boat, all parameters discussed here is intermediate between that of LaF 3 layer deposited by IBS and electron beam.Finally, based on consideration with every factors, thermal boat evaporation method is most suitable for depositing DUV LaF 3 film.关键词
薄膜/LaF3/热蒸发/离子束溅射/深紫外Key words
thin films/LaF3/thermal evaporation/ion beam sputtering/deep UV分类
数理科学引用本文复制引用
时光,梅林,高劲松,张立超,张玲花..离子束溅射、热舟和电子束法制备深紫外 LaF3薄膜[J].激光技术,2013,(5):592-595,4.基金项目
国家科技重大专项资助项目 （）
