物理学报Issue(7)：252-261,10.DOI:10.7498/aps.62.075201
N2微空心阴极放电特性及其阴极溅射的PIC/MC模拟
Simulation of N2 microhollow cathode discharge and cathode sputtering by using a PIC/MC model∗
摘要
Abstract
The nitrogen microhollow cathode discharge and Ti cathode sputtering, bombarded by ions (N+2 , N+), have been studied using a two-dimensional PIC/MCC model. The behavior of ions (N+2 , N+) and sputtered atom (Ti), and the thermalization process of the sputtered atoms in a nitrogen microhollow cathode discharge are simulated. The results show that hollow cathode effect is due to electron oscillations in the overlapping negative glow under our simulation condition. The densities of ions (N+2 , N+) in the microhollow cathode discharge are two orders in magnitude greater than that in the conventional hollow cathode discharge;but the distributions and sizes of the mean energy of the ions (N+2 , N+) are almost the same. The density of N+2 is fivefold as much as that of N+ in the microdischarge space; however, the maximum of mean energy of the latter is twice larger than the former. For various parameters (P,T,V), the densities of ions(N+2 , N+) bombarding the cathode internal surface are almost uniformly distributed, and their mean energy are almost the same. When these atoms are 0.15 mm away from the cathode. The sputtered atoms are almost thermalized completely.关键词
微空心阴极放电/PIC/MC模拟/N2等离子体Key words
microhollow cathode/PIC/MC simulation/N2 plasma引用本文复制引用
张连珠†,孟秀兰,张素,高书侠,赵国明..N2微空心阴极放电特性及其阴极溅射的PIC/MC模拟[J].物理学报,2013,(7):252-261,10.基金项目
中国工程物理研究院重点发展基金(批准号:2011A0102005)资助的课题 （批准号:2011A0102005）
