物理学报Issue(8)：1-6,6.DOI:10.7498/aps.62.084207
脉冲激光沉积法制备的ZnO薄膜的低阈值电抽运紫外随机激射
Low-threshold electrically pumped ultraviolet random lasing from ZnO film prepared by pulsed laser deposition∗
摘要
Abstract
ZnO films on silicon substrates are prepared by reactive sputtering and pulsed laser deposition, respectively. Their crystallini-ties, surface morphologies and photoluminescence actions are characterized using X-ray diffraction, scanning electron microscopy and photoluminescence spectroscopy correspondingly. Furthermore, the electrically pumped random laser actions of the two metal-insulator-semiconductor structured devices based on the sputtered and pulse laser deposition ZnO films respectively are comparatively investigated. It is found that the device fabricated using the pulse laser deposition ZnO film possesses a much lower threshold current for random lasing and higher output optical power. This is due to the fact that the pulse laser deposition ZnO film has much fewer defects, leading to remarkably lower optical loss during the multiple scattering within such a ZnO film.关键词
随机激射/ZnO薄膜/脉冲激光沉积/溅射Key words
random lasing/ZnO thin film/pulsed laser deposition/sputtering引用本文复制引用
徐韵,李云鹏,金璐,马向阳†,杨德仁..脉冲激光沉积法制备的ZnO薄膜的低阈值电抽运紫外随机激射[J].物理学报,2013,(8):1-6,6.基金项目
中国科学院、国家外国专家局创新团队国际合作伙伴计划和国家自然科学基金(批准号:61201193)资助的课题.*Project supported by the Chinese Academy of Sciences/State Administration of Foreign Experts Affairs (CAS/SAFEA) International Partnership Pro-gram for Creative Research Teams and the National Natural Science Foundation of China (Grant No.61201193) （批准号:61201193）
