物理学报Issue(8)：1-5,5.DOI:10.7498/aps.62.087901
高入射能量下的金属二次电子发射模型
Model of secondary electron emission at high incident electron energy for metal∗
摘要
Abstract
The models of the true secondary electron emission and backscattered electron emission for metal are provided, based on the physical process of secondary electron emission from metal at high incident electron energy. The formula for the true secondary electron yield at high incident electron energy is derived with the Bethe equation known to provide accurate and simple analytical expressions for the stopping power and the probability that a secondary electron produced in a material reaches the surface and is emitted into the vacuum. The formula for the backscattered electron yield at high incident electron energy is derived with the absorbing rule for the incident electron in the material. All the above results lead to a new model for secondary electron emission from metal at high incident electron energy. The secondary electron yields of Au, Ag, Cu and Al derived with the new model are in good agreement with the results obtained from the scatters process simulation code-Casino.关键词
二次电子发射/高入射能量/金属表面/散射过程Key words
secondary electron emission/high incident electron energy/metal surface/scatters process引用本文复制引用
杨文晋,李永东†,刘纯亮..高入射能量下的金属二次电子发射模型[J].物理学报,2013,(8):1-5,5.基金项目
国家自然科学基金(批准号:61201363,61271305,60972093)、高等学校博士学科点专项科研基金(批准号:20110009110001)、中央高校基本科研业务费(批准号:2011JBM003)和北京交通大学人才基金(批准号:2012RC036)资助的课题.*Project supported by the National Natural Science Foundation of China (Grant Nos.61201363,61271305,60972093), the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No.20110009110001), the Fundamental Research Fund for the Central Universities, China (Grant No.2011JBM003), and the Talents Foundation of Beijing Jiaotong University, China (Grant No.2012RC036) （批准号:61201363,61271305,60972093）
