物理学报Issue(10)：392-398,7.DOI:10.7498/aps.62.108101
磁控溅射沉积铝/贫铀与金/贫铀镀层的界面研究*
Study on interface of Al/depleted uranium and Au/depleted uranium layers deposited by magnetron sputtering∗
摘要
Abstract
Aluminum/depleted uranium/aluminum (Al/DU/Al) and gold/depleted uranium/gold (Au/DU/Au)“sandwich structure”films are deposited by magnetron sputtering. Diffusions of Al/DU and Au/DU interface of these samples are investigated by high resolution scanning electronic microscope, X-ray diffraction, X-ray photoelectron spectrometer and scanning auger microprobe. The results show that deposited DU layer is of columnar grain. Significant diffusion takes place at Al/DU interface. Intermetallic compounds of Al2U and Al3U are formed at Al/DU interface by chemical reaction between Al and DU which induces chemical shift toward high binding energy of Al 2p and toward low binding energy of U 4f. Microdosages of O exist in Al over-layers as Al2O3, in Al/DU interface as Al2O3 and oxidation of uranium, and in DU layers as oxidation of uranium respectively. Just simple physical diffusion takes place at Au/DU interface. Binding energies of Au 4f and U 4f shift toward high-energy tail induced by cluster effect at the Au/DU interface. Microdosages of O exist at Au/DU interface and in DU layers as oxidation of uranium. Diffusion at the Al/DU interface is more obvious than at Au/DU surface. Under the condition of the same thickness valuses Al over-layer is more effective than Au over layer to protect uranium layer from oxidging.关键词
Al/DU界面/Au/DU界面/磁控溅射/界面扩散Key words
Al/DU interface/Au/DU interface/magnetron sputtering/diffusion at interface引用本文复制引用
易泰民,马坤全,邢丕峰,郑凤成,梅鲁生,杨蒙生,赵利平,李朝阳,谢军,杜凯..磁控溅射沉积铝/贫铀与金/贫铀镀层的界面研究*[J].物理学报,2013,(10):392-398,7.基金项目
国家重点基础研究发展计划(批准号:2011CB610402)和国家自然科学基金(批准号:50971102,50901061)资助的课题.@@@@Project supported by the National Basic Research Program of China (Grant No.2011CB610402), and the National Natural Science Foundation of China (Grant Nos.50971102,50901061) （批准号:2011CB610402）
