物理学报Issue(15)：1-9,9.DOI:10.7498/aps.62.158107
不同衬底和 CdCl2退火对磁控溅射 CdS薄膜性能的影响*
Effects of different substrates and CdCl2 treatment on the properties of CdS thin films deposited by magnetron sputtering*
摘要
Abstract
CdS films were deposited on corning 9059 glass, FTO, ITO and AZO substrates by r.f. magnetron sputtering, and annealed at 380 ◦C in CdCl2+ dry air. Effects of different types of substrate and thermal annealing on the morphology, structure and optical properties were investigated. Field emission scanning electron microscope shows: the morphology of as-deposited and annealed CdS thin films on different substrates is different, grain size and surface roughness increase significantly with annealing. XRD diffraction patterns show: the structure of as-deposited and annealed CdS thin films on different substrates are mixed phase structure of hexagonal and cubic phases, there is a preferential orientation of the crystallits with the hexagonal (002) and cubic (111) peak for as-deposited and annealed CdS films on corning 9059 glass, FTO, and AZO substrates, for as-deposited CdS film on ITO substrate there is no preferentially oriented diffraction peaks, but has highly oriented with hexagonal (002) or cubic (111) peak after annealing; UV-Vis spectrophotometer spectrum analysis shows: the average transmittance in visible spectrum of CdS thin films deposited on AZO, FTO, ITO and Corning 7059 glass substrates in turn decreases, annealing increases the corresponding substrate of CdS films in visible light transmittance, reduces the optical absorption coefficient; annealing significantly increases the band gap of CdS films on different substrates. Analysis reveals that the performance comes from the result of different types of substrate and annealing process for morphology and structure of CdS thin films, and the band tail states changes, due to variation of doping concentration.关键词
CdS 薄膜/磁控溅射/退火再结晶/带尾态Key words
CdS thin films/magnetron sputtering/annealing and recrystallization/band tail states引用本文复制引用
张传军,邬云骅,曹鸿,高艳卿,赵守仁,王善力,褚君浩..不同衬底和 CdCl2退火对磁控溅射 CdS薄膜性能的影响*[J].物理学报,2013,(15):1-9,9.基金项目
中国科学院知识创新工程重要方向项目(批准号：KGCX2-YW-384)和上海市2012年度“科技创新行动计划”节能减排领域项目(批准号:12dz1201000)资助的课题.* Project supported by the Main Direction Program of Knowledge Innovation of Chinese Academy of Sciences (Grant No. KGCX2-YW-384), and 2012 Annual Energy-Saving and Emission Reduction Projects “Scientific and Technological Innovation Plan of Action” of Shanghai, China (Grant No.12dz1201000) （批准号：KGCX2-YW-384）
