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A new kind of chelating agent with low pH value applied in the TSV CMP slurry

Hong Jiao Liu Yuling Zhang Baoguo Niu Xinhuan Han Liying

半导体学报（英文版）2015，Vol.36Issue(12)：143-146,4.

半导体学报（英文版）2015，Vol.36Issue(12)：143-146,4.DOI:10.1088/1674-4926/36/12/126001

A new kind of chelating agent with low pH value applied in the TSV CMP slurry

Hong Jiao ¹Liu Yuling ²Zhang Baoguo ¹Niu Xinhuan ²Han Liying¹

作者信息

1. School of Electronic Information Engineering,Hebei University of Technology,Tianjin 300130,China
2. Tianjin Key Laboratory of Electronic Materials and Devices,Tianjin 300130,China
折叠

摘要

关键词

low pH value/alkaline slurry/removal rate/roughness

Key words

low pH value/alkaline slurry/removal rate/roughness

引用本文复制引用

Hong Jiao,Liu Yuling,Zhang Baoguo,Niu Xinhuan,Han Liying..A new kind of chelating agent with low pH value applied in the TSV CMP slurry[J].半导体学报（英文版）,2015,36(12):143-146,4.

基金项目

Project supported by the Major National Science and Technology Special Projects (No.2009ZX02308), the Fund Project of Hebei Provincial Department of Education, China (No.QN2014208), the Natural Science Foundation of Hebei Province, China (No.E2013202247), and the Colleges and Universities Scientific Research Project of Hebei Province, China (No.Z2014088). （No.2009ZX02308）

半导体学报（英文版）

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ISSN：1674-4926

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