太赫兹科学与电子信息学报2015，Vol.13Issue(6)：980-982,3.DOI:10.11805/TKYDA201506.0980
Au薄膜溅射功率对ZnO/Au复合薄膜质量的影响
Performance of ZnO/Au composite film at different sputtering powers
王旭光 1姚明秋 1席仕伟 1徐韩1
作者信息
- 1. 中国工程物理研究院电子工程研究所,四川绵阳 621999
- 折叠
摘要
Abstract
Au films sputtered at different sputtering powers on ZnO surfaces are deposited. The effects of different sputtering powers on the deposition rates, crystal quality and bonding force between Au and ZnO film are researched. Au films at sputtering power of 100 W features the best performance compared with that at other sputtering powers. The influences of different sputtering powers on the resistances of ZnO membranes are studied as well. The results show that the higher the sputtering power, the more likely the ZnO resistance is broken-down; and an Au film at the sputtering power of 100 W shows the smallest influence on ZnO resistance.关键词
溅射/溅射功率/Au薄膜/ZnO电阻Key words
sputtering/sputtering power/gold membrane/ZnO resistance分类
机械制造引用本文复制引用
王旭光,姚明秋,席仕伟,徐韩..Au薄膜溅射功率对ZnO/Au复合薄膜质量的影响[J].太赫兹科学与电子信息学报,2015,13(6):980-982,3.
